About LOG3Mask
LOG3Mask innovation demonstrated to wipe out 99.9% of viral particles inside 10 minutes. Affirmed by an autonomous dermatology research center, the LOG3Mask empowered LOG3Mask is non-aggravation and hypoallergenic. The veil utilizes eco-accommodating materials and fixings, perceived as protected by the FDA. Textures treated with ZioShield innovation have been exhibited to keep up with their antimicrobial movement. Freely tried by the Particle Measurement and Technology Laboratory at the Missouri University of Science and Technology (USA), the LOG3Mask is a novel three-layer plan with filtration proficiency, better than careful/clinical veils for molecule size 200 nm-5000 nm and reaches over. The LOG3Mask, highlighting ZioShield innovation, was chosen as a best 40 finalist in a public rivalry to foster inventive cover innovation.